High density and low leakage current in TiO 2 MIM capacitors processed at 300°C

C. H. Cheng*, S. H. Lin, K. Y. Jhou, W. J. Chen, C. P. Chou, F. S. Yeh, Jim Hu, M. Hwang, T. Arikado, Sean P. McAlister, Albert Chin

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

60 Scopus citations

Fingerprint

Dive into the research topics of 'High density and low leakage current in TiO <sub>2</sub> MIM capacitors processed at 300°C'. Together they form a unique fingerprint.

Engineering & Materials Science

Chemical Compounds