HfO ₂ MIS capacitor with copper gate electrode

Keyphrases

• HfO2 100%
• Gate Electrode 100%
• MIS Capacitors 100%
• Copper Gate 100%
• Silica 50%
• Capacitors 50%
• Dielectric 50%
• Gate Dielectric 25%
• Manufacturing Process 25%
• Cu Metal 25%
• Metal-insulator-metal Capacitor 25%
• Charge to Breakdown 25%
• High Density 25%
• High Capacitance 25%
• Bias Temperature Stress 25%
• Cu Diffusion 25%
• Ultralarge-scale Integration 25%
• Reliability Degradation 25%
• Drift Rate 25%
• Atomic Vapor Deposition 25%
• HfO2 Dielectric 25%

Engineering

• Dielectrics 100%
• Gate Electrode 100%
• Vapor Deposition 33%
• Gate Dielectric 33%
• Manufacturing Process 33%
• Copper (Cu) 33%
• Scale Integration 33%
• Temperature Stress 33%
• Metal-Insulator-Semiconductor Capacitor 33%

Material Science

• Dielectric Material 100%
• Capacitor 100%
• Aluminum 50%
• Density 25%
• Capacitance 25%