Growth and characterization of c-plane AlGaN on γ-LiAlO2

C. J. Tun*, Cheng-Huang Kuo, Y. K. Fu, C. W. Kuo, Mitch M.C. Chou, G. C. Chi

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

This study demonstrates a pure c-plane AlGaN epilayer grown on a γ-LiAlO2 (1 0 0) (LAO) substrate with an AlN nucleation layer grown at a relatively low temperature (LT-AlN) by metal-organic chemical vapor deposition (MOCVD). The AlGaN film forms polycrystalline film with m- and c-plane when the nucleation layer grows at a temperature ranging from 660 to 680 °C. However, a pure c-plane AlGaN film with an Al content of approximately 20% can be obtained by increasing the LT-AlN nucleation layer growth temperature to 700 °C. This is because the nuclei density of AlN increases as the growth temperature increases, and a higher nuclei density of AlN deposited on LAO substrate helps prevent the deposition of m-plane AlGaN. Therefore, high-quality and crack-free AlGaN films can be obtained with a (0 0 0 2) ω-rocking curve FWHM of 547 arcsec and surface roughness of 0.79 nm (root-mean-square) using a 700-°C-grown LT-AlN nucleation layer.

Original languageEnglish
Pages (from-to)3726-3730
Number of pages5
JournalJournal of Crystal Growth
Volume311
Issue number14
DOIs
StatePublished - 1 Jul 2009

Keywords

  • A3. MOCVD
  • B1. AlGaN
  • B1. AlN
  • B1. GaN
  • B1. LiAlO

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