Generally applicable self-masking technique for nanotips array fabrication

Kuei Hsien Chen*, Chih Hsun Hsu, Hung Chun Lo, Surojit Chattopadhyay, Chien Ting Wu, Jih Shang Hwang, Ying Jay Yang, L. I.Chyong Chen

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review


Well-aligned nanotip arrays were fabricated via a self-masking dry etching technique in an electron cyclotron resonance (ECR) plasma process. Nanotip arrays of Si, poly silicon, GaN, GaP, sapphire, and Al were fabricated. Simultaneous etching of the substrate and formation of silicon carbide (SiC) protecting caps are attributed to the nanotip formation. The ultra-low turn-on field for electron field emission as well as the surface enhanced Raman Spectroscopic study of Si nanotips is also demonstrated.

Original languageEnglish
Pages (from-to)879-886
Number of pages8
JournalInternational Journal of Nanoscience
Issue number5-6
StatePublished - Oct 2005


  • Chemical vapor deposition
  • Electron cyclotron resonance
  • Field emission
  • Nanostructure
  • Surface-enhanced Raman spectroscopy


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