Generally applicable self-masking technique for nanotips array fabrication

Kuei Hsien Chen*, Chih Hsun Hsu, Hung Chun Lo, Surojit Chattopadhyay, Chien Ting Wu, Jih Shang Hwang, Debajyoti Das, Li Chyong Chen

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

6 Scopus citations


Well-aligned nanotip arrays were fabricated via a self-masking dry etching technique in an electron cyclotron resonance (ECR) plasma process. Nanotip arrays of Si, poly silicon, GaN, GaP, sapphire, and Al were fabricated. Simultaneous etching of the substrate and formation of silicon carbide (SiC) protecting caps are attributed to the nanotip formation. The ultra-low turn on filed for electron field emission as well as the surface enhanced Raman Spectroscopic study of Si nanotips is also demonstrated.

Original languageEnglish
Pages (from-to)129-134
Number of pages6
JournalTamkang Journal of Science and Engineering
Issue number3
StatePublished - 1 Sep 2004


  • Field Emission
  • Nanotip
  • Surface Enhanced Raman Spectroscopy


Dive into the research topics of 'Generally applicable self-masking technique for nanotips array fabrication'. Together they form a unique fingerprint.

Cite this