Fully Silicided NiSi and Germanided NiGe Dual Gates on SiO 2/Si and Al 2O 3/Ge-On-Insulator MOSFETs

C. H. Huang*, D. S. Yu, Albert Chin, C. H. Wu, W. J. Chen, Chunxiang Zhu, M. F. Li, Byung Jin Cho, Dim Lee Kwong

*Corresponding author for this work

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