First Integration of 10-V CMOS Logic Circuit, 20-V Gate Driver, and 600-V VDMOSFET on a 4H-SiC Single Chip

B. Y. Tsui*, C. L. Hung, T. K. Tsai, Y. C. Tsui, T. W. Wang, Y. X. Wen, C. P. Shih, J. C. Wang, L. J. Lin, C. H. Wang, K. W. Chu, Po-Hung Chen

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

16 Scopus citations

Abstract

In this work, we reported the integration of 10-V CMOS logic circuit, 20-V gate driver, and 600-V VDMOSFET on a 4H-SiC single chip for full SiC smart power ICs. This integration process features PMOSFET isolation (P-iso) from the high voltage substrate, local oxidation of SiC isolation between devices, dual gate oxide thickness, and P+ poly-Si gate. It is demonstrated that the blocking capability of the P-iso structure can exceed 700 V and the switch of the VDMOSFET can be controlled by a 10-V signal through a 10-V to 20-V level shifter and a 20-V gate driver.

Original languageEnglish
Title of host publication2022 34th International Symposium on Power Semiconductor Devices and ICs, ISPSD 2022
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages321-324
Number of pages4
ISBN (Electronic)9781665422017
DOIs
StatePublished - 2022
Event34th IEEE International Symposium on Power Semiconductor Devices and ICs, ISPSD 2022 - Vancouver, Canada
Duration: 22 May 202225 May 2022

Publication series

NameProceedings of the International Symposium on Power Semiconductor Devices and ICs
Volume2022-May
ISSN (Print)1063-6854

Conference

Conference34th IEEE International Symposium on Power Semiconductor Devices and ICs, ISPSD 2022
Country/TerritoryCanada
CityVancouver
Period22/05/2225/05/22

Keywords

  • CMOS
  • gate driver
  • isolation
  • power IC
  • silicon carbide
  • single-chip integration
  • VDMOSFET

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