Film profile engineering (FPE): A new concept for manufacturing of short-channel metal oxide TFTs

Rong Jhe Lyu; Horng-Chih Lin; Ming Hung Wu; Bo Shiuan Shie; Hsiang Ting Hung; Tiao Yuan Huang

doi:10.1109/IEDM.2013.6724607

Film profile engineering (FPE): A new concept for manufacturing of short-channel metal oxide TFTs

Rong Jhe Lyu, Horng-Chih Lin, Ming Hung Wu, Bo Shiuan Shie, Hsiang Ting Hung, Tiao Yuan Huang

Institute of Electronics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

18 Scopus citations

Abstract

A film profile engineering (FPE) concept which utilizes the unique features of various deposition tools to tailor and optimize the profile of the deposited films was demonstrated with the fabricated ZnO TFTs. By implementing the PR trimming technique, high performance devices with L < 100 nm can be readily achieved.

Original language	English
Title of host publication	2013 IEEE International Electron Devices Meeting, IEDM 2013
Pages	11.2.1-11.2.4
DOIs	https://doi.org/10.1109/IEDM.2013.6724607
State	Published - 2013
Event	2013 IEEE International Electron Devices Meeting, IEDM 2013 - Washington, DC, United States Duration: 9 Dec 2013 → 11 Dec 2013

Publication series

Name	Technical Digest - International Electron Devices Meeting, IEDM
ISSN (Print)	0163-1918

Conference

Conference	2013 IEEE International Electron Devices Meeting, IEDM 2013
Country/Territory	United States
City	Washington, DC
Period	9/12/13 → 11/12/13

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10.1109/IEDM.2013.6724607

Cite this

Lyu, R. J., Lin, H.-C., Wu, M. H., Shie, B. S., Hung, H. T., & Huang, T. Y. (2013). Film profile engineering (FPE): A new concept for manufacturing of short-channel metal oxide TFTs. In 2013 IEEE International Electron Devices Meeting, IEDM 2013 (pp. 11.2.1-11.2.4). Article 6724607 (Technical Digest - International Electron Devices Meeting, IEDM). https://doi.org/10.1109/IEDM.2013.6724607

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title = "Film profile engineering (FPE): A new concept for manufacturing of short-channel metal oxide TFTs",

abstract = "A film profile engineering (FPE) concept which utilizes the unique features of various deposition tools to tailor and optimize the profile of the deposited films was demonstrated with the fabricated ZnO TFTs. By implementing the PR trimming technique, high performance devices with L < 100 nm can be readily achieved.",

author = "Lyu, {Rong Jhe} and Horng-Chih Lin and Wu, {Ming Hung} and Shie, {Bo Shiuan} and Hung, {Hsiang Ting} and Huang, {Tiao Yuan}",

year = "2013",

doi = "10.1109/IEDM.2013.6724607",

language = "English",

isbn = "9781479923076",

series = "Technical Digest - International Electron Devices Meeting, IEDM",

pages = "11.2.1--11.2.4",

booktitle = "2013 IEEE International Electron Devices Meeting, IEDM 2013",

note = "2013 IEEE International Electron Devices Meeting, IEDM 2013 ; Conference date: 09-12-2013 Through 11-12-2013",

}

Lyu, RJ, Lin, H-C, Wu, MH, Shie, BS, Hung, HT & Huang, TY 2013, Film profile engineering (FPE): A new concept for manufacturing of short-channel metal oxide TFTs. in 2013 IEEE International Electron Devices Meeting, IEDM 2013., 6724607, Technical Digest - International Electron Devices Meeting, IEDM, pp. 11.2.1-11.2.4, 2013 IEEE International Electron Devices Meeting, IEDM 2013, Washington, DC, United States, 9/12/13. https://doi.org/10.1109/IEDM.2013.6724607

Film profile engineering (FPE): A new concept for manufacturing of short-channel metal oxide TFTs. / Lyu, Rong Jhe; Lin, Horng-Chih; Wu, Ming Hung et al.
2013 IEEE International Electron Devices Meeting, IEDM 2013. 2013. p. 11.2.1-11.2.4 6724607 (Technical Digest - International Electron Devices Meeting, IEDM).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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AB - A film profile engineering (FPE) concept which utilizes the unique features of various deposition tools to tailor and optimize the profile of the deposited films was demonstrated with the fabricated ZnO TFTs. By implementing the PR trimming technique, high performance devices with L < 100 nm can be readily achieved.

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Film profile engineering (FPE): A new concept for manufacturing of short-channel metal oxide TFTs

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