Femtosecond multistep laser etching of transparent amorphous organic film

Yoichiroh Hosokawa; Masaki Yashiro; Tsuyoshi Asahi; Hiroshi Masuhara; Toshiaki Kadota; Yasuhiko Shirota

doi:10.1143/jjap.40.l1116

Femtosecond multistep laser etching of transparent amorphous organic film

Yoichiroh Hosokawa, Masaki Yashiro, Tsuyoshi Asahi^*, Hiroshi Masuhara, Toshiaki Kadota, Yasuhiko Shirota

^*Corresponding author for this work

Department of Applied Chemistry

Research output: Contribution to journal › Letter › peer-review

13 Scopus citations

Abstract

Novel laser etching was demonstrated by one-shot femtosecond laser ablation of a transparent organic amorphous film. The etch depth increased stepwise with increasing laser fluence and each step is constant and independent of the fluence, while the number of steps and etching area increase with the fluence. The successive depths were 270, 480, 690 and 820 nm, for which the thresholds were 180, 180, 210 and 290 mJ/cm², respectively. A fifth step was not observed in the present fluence range. Both the etched surfaces and slopes between the steps are very smooth with a roughness of less than 10 nm. The mechanism is proposed and discussed in view of the optical interference effect and a possible application is mentioned.

Original language	English
Pages (from-to)	L1116-L1118
Journal	Japanese Journal of Applied Physics, Part 2: Letters
Volume	40
Issue number	10 B
DOIs	https://doi.org/10.1143/jjap.40.l1116
State	Published - 15 Oct 2001

Keywords

Femtosecond laser ablation
Multistep laser etching
Optical interference effect
Organic amorphous film

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10.1143/jjap.40.l1116

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title = "Femtosecond multistep laser etching of transparent amorphous organic film",

abstract = "Novel laser etching was demonstrated by one-shot femtosecond laser ablation of a transparent organic amorphous film. The etch depth increased stepwise with increasing laser fluence and each step is constant and independent of the fluence, while the number of steps and etching area increase with the fluence. The successive depths were 270, 480, 690 and 820 nm, for which the thresholds were 180, 180, 210 and 290 mJ/cm2, respectively. A fifth step was not observed in the present fluence range. Both the etched surfaces and slopes between the steps are very smooth with a roughness of less than 10 nm. The mechanism is proposed and discussed in view of the optical interference effect and a possible application is mentioned.",

keywords = "Femtosecond laser ablation, Multistep laser etching, Optical interference effect, Organic amorphous film",

author = "Yoichiroh Hosokawa and Masaki Yashiro and Tsuyoshi Asahi and Hiroshi Masuhara and Toshiaki Kadota and Yasuhiko Shirota",

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language = "English",

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TY - JOUR

T1 - Femtosecond multistep laser etching of transparent amorphous organic film

AU - Hosokawa, Yoichiroh

AU - Yashiro, Masaki

AU - Asahi, Tsuyoshi

AU - Masuhara, Hiroshi

AU - Kadota, Toshiaki

AU - Shirota, Yasuhiko

PY - 2001/10/15

Y1 - 2001/10/15

N2 - Novel laser etching was demonstrated by one-shot femtosecond laser ablation of a transparent organic amorphous film. The etch depth increased stepwise with increasing laser fluence and each step is constant and independent of the fluence, while the number of steps and etching area increase with the fluence. The successive depths were 270, 480, 690 and 820 nm, for which the thresholds were 180, 180, 210 and 290 mJ/cm2, respectively. A fifth step was not observed in the present fluence range. Both the etched surfaces and slopes between the steps are very smooth with a roughness of less than 10 nm. The mechanism is proposed and discussed in view of the optical interference effect and a possible application is mentioned.

AB - Novel laser etching was demonstrated by one-shot femtosecond laser ablation of a transparent organic amorphous film. The etch depth increased stepwise with increasing laser fluence and each step is constant and independent of the fluence, while the number of steps and etching area increase with the fluence. The successive depths were 270, 480, 690 and 820 nm, for which the thresholds were 180, 180, 210 and 290 mJ/cm2, respectively. A fifth step was not observed in the present fluence range. Both the etched surfaces and slopes between the steps are very smooth with a roughness of less than 10 nm. The mechanism is proposed and discussed in view of the optical interference effect and a possible application is mentioned.

KW - Femtosecond laser ablation

KW - Multistep laser etching

KW - Optical interference effect

KW - Organic amorphous film

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U2 - 10.1143/jjap.40.l1116

DO - 10.1143/jjap.40.l1116

M3 - Letter

AN - SCOPUS:0035888708

SN - 0021-4922

VL - 40

SP - L1116-L1118

JO - Japanese Journal of Applied Physics, Part 2: Letters

JF - Japanese Journal of Applied Physics, Part 2: Letters

IS - 10 B

ER -

Femtosecond multistep laser etching of transparent amorphous organic film

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Keywords

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