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Fabrication of NiSi2 nanocrystals embedded in SiO2 with memory effect by oxidation of the amorphous Si/Ni/SiO2 structure
P. H. Yeh*, H. H. Wu, C. H. Yu, L. J. Chen, Po-Tsun Liu, C. H. Hsu, T. C. Chang
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
10
Scopus
citations