Fabricating bi-layered metallic wire-grid polarizers by nanoimprint and O ₂ plasma etching

Keyphrases

• Plasma Etching 100%
• Bi-layered 100%
• O2 Plasma 100%
• Nanoimprint 100%
• Wire Grid Polarizer 100%
• Wire Grating 100%
• Metal Wire Grid 100%
• Bilayered Structure 80%
• Optical Performance 40%
• Insertion Structure 40%
• Al Wire 40%
• PMMA Substrate 40%
• Field Emission Scanning Electron Microscopy (FE-SEM) 20%
• Dielectric 20%
• Proposed Architecture 20%
• Chemical Mechanical Polishing 20%
• Incident Light 20%
• Incident Angle 20%
• Extinction Ratio 20%
• Grid Structure 20%
• Aluminum Layer 20%
• High Extinction Ratio 20%
• Wire Grid 20%
• Efficient Process 20%
• S-polarization 20%
• P-polarization 20%
• Metallic Aluminum 20%
• Total Height 20%
• Aluminum Deposition 20%

Engineering

• Layered Structure 100%
• Metallic Wire 100%
• Optical Performance 50%
• Extinction Ratio 50%
• Dielectrics 25%
• Nanoscale 25%
• Chemical Mechanical Polishing 25%
• Light Incident 25%
• Incident Angle 25%
• Metallic Aluminum 25%

Material Science

• Polarizer 100%
• Plasma Etching 100%
• Poly Methyl Methacrylate 100%
• Aluminum 33%
• Chemical Mechanical Planarization 16%
• Linewidth 16%
• Focused Ion Beam 16%
• Field Emission Scanning Electron Microscopy 16%
• Dielectric Material 16%