Extended 0.13 μm CMOS technology for the ultra high-speed and MS/RF application segments

C. S. Chang*, C. P. Chao, Y. K. Leung, C. H. Lin, H. M. Hsu, Y. P. Wang, S. Y. Chang, T. H. Chiu, J. S. Shyu, C. C. Wu, C. H. Wang, R. Y. Chang, C. W. Chen, C. F. Huang, C. H. Chen, S. H. Chen, T. H. Yeh, J. Y. Cheng, J. J. Liaw, Y. L. ChuT. C. Ong, M. C. Yu, C. H. Yu, H. J. Lin, H. J. Tao, M. S. Liang, Y. C. See, C. H. Diaz, Y. C. Sun

*Corresponding author for this work

Research output: Contribution to conferencePaperpeer-review

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Chemical Compounds

Engineering & Materials Science