Exposure schedule for multiplexing holograms in photopolymer

Shiuan-Huei Lin; Ken-Yuh Hsu; Wei Zheng Chen; Wha Tzong Whang

doi:10.1117/12.363923

Exposure schedule for multiplexing holograms in photopolymer

Shiuan-Huei Lin^*, Ken-Yuh Hsu, Wei Zheng Chen, Wha Tzong Whang

^*Corresponding author for this work

Research output: Contribution to journal › Conference article › peer-review

9 Scopus citations

Abstract

We present dynamics of the grating formation process in phenanthrenequinone- (PQ-) doped poly(methyl methacrylate) (PMMA) photo-polymer. The exposure schedule for multiplexing holograms to achieve equal-strength storage in a single location is described. The analysis method is valid for any saturated media, thus the results can be applied to other photopolymer materials with similar kinetics.

Original language	English
Pages (from-to)	100-106
Number of pages	7
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	3801
DOIs	https://doi.org/10.1117/12.363923
State	Published - 1 Dec 1999
Event	Proceedings of the 1999 Photorefractive Fiber and Crystal Devices: Materials, Optical Properties, and Applications V - Denver, CO, USA Duration: 18 Jul 1999 → 19 Jul 1999

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title = "Exposure schedule for multiplexing holograms in photopolymer",

abstract = "We present dynamics of the grating formation process in phenanthrenequinone- (PQ-) doped poly(methyl methacrylate) (PMMA) photo-polymer. The exposure schedule for multiplexing holograms to achieve equal-strength storage in a single location is described. The analysis method is valid for any saturated media, thus the results can be applied to other photopolymer materials with similar kinetics.",

author = "Shiuan-Huei Lin and Ken-Yuh Hsu and Chen, {Wei Zheng} and Whang, {Wha Tzong}",

year = "1999",

month = dec,

day = "1",

doi = "10.1117/12.363923",

language = "English",

volume = "3801",

pages = "100--106",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

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note = "Proceedings of the 1999 Photorefractive Fiber and Crystal Devices: Materials, Optical Properties, and Applications V ; Conference date: 18-07-1999 Through 19-07-1999",

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TY - JOUR

T1 - Exposure schedule for multiplexing holograms in photopolymer

AU - Lin, Shiuan-Huei

AU - Hsu, Ken-Yuh

AU - Chen, Wei Zheng

AU - Whang, Wha Tzong

PY - 1999/12/1

Y1 - 1999/12/1

N2 - We present dynamics of the grating formation process in phenanthrenequinone- (PQ-) doped poly(methyl methacrylate) (PMMA) photo-polymer. The exposure schedule for multiplexing holograms to achieve equal-strength storage in a single location is described. The analysis method is valid for any saturated media, thus the results can be applied to other photopolymer materials with similar kinetics.

AB - We present dynamics of the grating formation process in phenanthrenequinone- (PQ-) doped poly(methyl methacrylate) (PMMA) photo-polymer. The exposure schedule for multiplexing holograms to achieve equal-strength storage in a single location is described. The analysis method is valid for any saturated media, thus the results can be applied to other photopolymer materials with similar kinetics.

UR - http://www.scopus.com/inward/record.url?scp=0033354293&partnerID=8YFLogxK

U2 - 10.1117/12.363923

DO - 10.1117/12.363923

M3 - Conference article

AN - SCOPUS:0033354293

SN - 0277-786X

VL - 3801

SP - 100

EP - 106

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Proceedings of the 1999 Photorefractive Fiber and Crystal Devices: Materials, Optical Properties, and Applications V

Y2 - 18 July 1999 through 19 July 1999

ER -

Exposure schedule for multiplexing holograms in photopolymer

Abstract

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