Exploring Next-Generation GaN Power Devices with Ferroelectric Charge Trap Gate Stack Technology for Normally-OFF Operations

Edward Yi Chang*, Jui Sheng Wu, Tsung Ying Yang, Chen Hsi Tsai

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Original languageEnglish
Title of host publication2023 21st International Workshop on Junction Technology, IWJT 2023
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9784863488076
DOIs
StatePublished - 2023
Event21st International Workshop on Junction Technology, IWJT 2023 - Hybrid, Kyoto, Japan
Duration: 8 Jun 20239 Jun 2023

Publication series

Name2023 21st International Workshop on Junction Technology, IWJT 2023

Conference

Conference21st International Workshop on Junction Technology, IWJT 2023
Country/TerritoryJapan
CityHybrid, Kyoto
Period8/06/239/06/23

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