Evaluation of plasma charging damage in ultrathin gate oxides

Horng-Chih Lin*, Chi Chun Chen, Chao-Hsin Chien, Szu Kang Hsein, Meng Fan Wang, Tien-Sheng Chao, Tiao Yuan Huang, Chun Yen Chang

*Corresponding author for this work

Research output: Contribution to journalReview articlepeer-review

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Engineering & Materials Science

Chemical Compounds