Etching Gas

Keyphrases

• Capacitance Model 20%
• CF3I 100%
• Circuit Performance 20%
• Delay Time 20%
• Etching Gas 100%
• Etching Rate 20%
• F-radical 20%
• Fluorocarbon Gases 20%
• Fluoropolymer 20%
• Gas Chemistry 40%
• Gas Plasma 20%
• High Performance 20%
• High-frequency Plasma 20%
• Highly Selective 20%
• Low Damage 20%
• Low-k Film 20%
• Radical Generation 20%
• Silica 20%
• Silicon Dioxide 20%
• SiO2 Etching 20%
• Tetrafluoroethylene 20%
• Ultra-high Frequency 20%
• Ultra-large-scale 20%
• UV Photons 20%
• Very Large Scale Integrated Circuits 20%

Material Science

• Capacitance 50%
• Electronic Circuit 100%
• Film 50%
• Fluoropolymer 50%
• Silicon 50%
• Silicon Dioxide 50%