Etching characteristics and mechanism of Ba_0.7Sr_0.3TiO₃ thin films in an inductively coupled plasma

Keyphrases

• Inductively Coupled Plasma 100%
• Gas Mixture 100%
• Ar Gas 100%
• Ba0.7Sr0.3TiO3 100%
• Chemical Reaction 100%
• Etch Characteristics 100%
• Etching Mechanism 100%
• Plasma Etching 50%
• Atomic Force Microscopy 50%
• Surface Roughness 50%
• Surface Morphology 50%
• X-ray Photoelectron Spectroscopy 50%
• Scanning Electron Microscopy 50%
• Surface Reaction 50%
• Bombardment 50%
• Substrate Bias 50%
• Smooth Surface 50%
• Anisotropy 50%
• Etching Process 50%
• Plasma Deposition 50%
• Plasma Power 50%
• Etch Profile 50%
• Etching Parameters 50%
• Inductively Coupled Plasma Etching 50%
• Etching Behavior 50%
• Missing Residues 50%
• Thermochemical Calculations 50%
• Physical Etching 50%

Material Science

• Thin Films 100%
• Gas Mixture 66%
• Surface Roughness 33%
• Surface Morphology 33%
• X-Ray Photoelectron Spectroscopy 33%
• Scanning Electron Microscopy 33%
• Surface Reaction 33%
• Plasma Etching 33%
• Anisotropy 33%
• Plasma Deposition 33%
• Atomic Force Microscopy 33%