Estimating the Process Variation Effects of Stacked Gate All Around Si Nanosheet CFETs Using Artificial Neural Network Modeling Framework

Rajat Butola, Yiming Li*, Sekhar Reddy Kola, Min Hui Chuang, Chandni Akbar

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

3 Scopus citations

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Keyphrases

Engineering

Material Science