ESD protection structure with embedded high-voltage P-type SCR for automotive vacuum-fluorescent-display (VFD) applications

Ming-Dou Ker*, Wei Jen Chang, Marcus Yang, Cheng Chung Chen, Mu Chin Chan, Wuu Trong Shieh, Kuo Lung Yen

*Corresponding author for this work

    Research output: Contribution to conferencePaperpeer-review

    1 Scopus citations

    Abstract

    A new ESD protection structure of HVPSCR embedded into the high-voltage PMOS device is proposed to greatly improve ESD robustness of the vacuum-fluorescent-display (VFD) driver IC for automotive electronics applications. By only adding the additional N+ diffusion into the drain region of HVPMOS, the It2 of output cell has been greatly improved form 0.07A to be greater than 6A within the almost same layout area. Such an ESD-enhanced VFD driver IC has been in mass production for automotive applications in car to sustain HBM ESD stress of up to 8kV.

    Original languageEnglish
    Pages67-70
    Number of pages4
    DOIs
    StatePublished - Jun 2005
    Event12th International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2005 - Singapore, Singapore
    Duration: 27 Jun 20051 Jul 2005

    Conference

    Conference12th International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2005
    Country/TerritorySingapore
    CitySingapore
    Period27/06/051/07/05

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