ESD protection design to overcome internal damages on interface circuits of CMOS IC with multiple separated power pins

Ming-Dou Ker, Chyh Yih Chang, Yi Shu Chang

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    8 Scopus citations

    Abstract

    This paper reports a real case for ESD level improvement on a CMOS IC product with multiple separated power pins. After ESD stress, the internal damage has been found and located at the interface circuit connecting different circuit blocks with different power supplies. Some ESD designs are implemented to rescue this IC product to meet the required ESD specification. By adding only an extra ESD clamp NMOS with a channel width of 10 μm between the interface node and ground line, the HBM ESD level of this IC product can be improved from the original 0.5 kV to 3 kV. By connecting the separated VSS power lines through the ESD conduction circuit to a common VSS ESD bus realized by the seal ring, the HBM ESD level of the second version IC product with 12 separated power supplies pairs can be significantly improved from the original 1 kV up to > 5 kV, without noise coupling issue.

    Original languageEnglish
    Title of host publicationProceedings - 15th Annual IEEE International ASIC/SOC Conference, ASIC/SOC 2002
    EditorsJohn Chickanosky, Ram K. Krishnamurthy, P.R. Mukund
    PublisherInstitute of Electrical and Electronics Engineers Inc.
    Pages234-238
    Number of pages5
    ISBN (Electronic)0780374940
    DOIs
    StatePublished - 1 Jan 2002
    Event15th Annual IEEE International ASIC/SOC Conference, ASIC/SOC 2002 - Rochester, United States
    Duration: 25 Sep 200228 Sep 2002

    Publication series

    NameProceedings of the Annual IEEE International ASIC Conference and Exhibit
    Volume2002-January
    ISSN (Print)1063-0988

    Conference

    Conference15th Annual IEEE International ASIC/SOC Conference, ASIC/SOC 2002
    Country/TerritoryUnited States
    CityRochester
    Period25/09/0228/09/02

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