Original language | English |
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Number of pages | 1 |
Journal | IEEE Electron Device Letters |
Volume | 27 |
Issue number | 10 |
DOIs |
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State | Published - 1 Dec 2006 |
Erratum: "Device linearity comparison of uniformly doped and α-doped In 0.52 Al 0.48 As/In 0.6 Ga 0.4 As metamorphic HEMTs" (IEEE Electron Device Letters)
Y. C. Lin*, Edward Yi Chang, H. Yamaguchi, H. Hirayama, X. Y. Chang, C. Y. Chang
*Corresponding author for this work
Research output: Contribution to journal › Comment/debate