Enhancing the realism of sketch and painted portraits with adaptable patches

Yin Hsuan Lee, Yu Kai Chang, Yu Lun Chang, I-Chen Lin, Yu-Shuen Wang, Wen-Chieh Lin

Research output: Contribution to journalArticlepeer-review

4 Scopus citations


Realizing unrealistic faces is a complicated task that requires a rich imagination and comprehension of facial structures. When face matching, warping or stitching techniques are applied, existing methods are generally incapable of capturing detailed personal characteristics, are disturbed by block boundary artefacts, or require painting-photo pairs for training. This paper presents a data-driven framework to enhance the realism of sketch and portrait paintings based only on photo samples. It retrieves the optimal patches of adaptable shapes and numbers according to the content of the input portrait and collected photos. These patches are then seamlessly stitched by chromatic gain and offset compensation and multi-level blending. Experiments and user evaluations show that the proposed method is able to generate realistic and novel results for a moderately sized photo collection.

Original languageAmerican English
Pages (from-to)214-225
Number of pages12
JournalComputer Graphics Forum
Issue number1
StatePublished - Feb 2018


  • Facial modelling
  • Matting & compositing


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