Abstract
Surface passivation of solar cells is investigated using CF4 plasma treatment on low-temperature oxides to enhance the open-circuit voltage of the solar cells. Low-temperature oxides grown by a nitric acid solution are treated with the CF4 plasma. Solar cells undergoing this scheme show an improved performance, including low-saturation current density and good quantum efficiency at short wavelengths. Experimental results demonstrate that the CF4 plasma pretreatment on low-temperature oxides can significantly improve the open-circuit voltage, short-circuit current, and fill factor for silicon wafer-based solar cells. This technique is very promising for in-line solar cell manufacturing.
Original language | English |
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Article number | 6495702 |
Pages (from-to) | 665-667 |
Number of pages | 3 |
Journal | Ieee Electron Device Letters |
Volume | 34 |
Issue number | 5 |
DOIs | |
State | Published - 2013 |
Keywords
- CF plasma
- low-temperature oxides
- open-circuit voltage
- surface passivation