Enhancement of Ferroelectricity in 5 nm Metal-Ferroelectric-Insulator Technologies by Using a Strained TiN Electrode

Cheng Hung Wu; Kuan Chi Wang; Yu Yun Wang; Chenming Hu; Chun-Jung Su; Tian-Li Wu

doi:10.3390/nano12030468

Enhancement of Ferroelectricity in 5 nm Metal-Ferroelectric-Insulator Technologies by Using a Strained TiN Electrode

Cheng Hung Wu, Kuan Chi Wang, Yu Yun Wang, Chenming Hu, Chun-Jung Su^*, Tian-Li Wu

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

In this work, the ferroelectric characteristic of a 5 nm Hf_0.5Zr_0.5O₂ (HZO) metal-ferroelectric-insulator-semiconductor (MFIS) device is enhanced through strained complementary metal oxide semiconductor (CMOS)-compatible TiN electrode engineering. Strained TiN top-layer electrodes with different nitrogen (N) concentrations are deposited by adjusting the sputtering process conditions. The TiN electrode with 18% N exhibits a compressive characteristic, which induces tensile stress in a 5 nm HZO film. A device with 18% N in TiN shows a higher remanent polarization (2Pr) and larger capacitance value than the compared sample, indicating that the strained TiN is promising for enhancing the ferroelectricity of sub-5 nm HZO devices.

Original language	English
Article number	468
Pages (from-to)	1-8
Number of pages	8
Journal	Nanomaterials
Volume	12
Issue number	3
DOIs	https://doi.org/10.3390/nano12030468
State	Published - 1 Feb 2022

Keywords

Compressive
Ferroelectric
HfZrO2
Strained TiN
Sub-5 nm

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10.3390/nano12030468

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title = "Enhancement of Ferroelectricity in 5 nm Metal-Ferroelectric-Insulator Technologies by Using a Strained TiN Electrode",

abstract = "In this work, the ferroelectric characteristic of a 5 nm Hf0.5Zr0.5O2 (HZO) metal-ferroelectric-insulator-semiconductor (MFIS) device is enhanced through strained complementary metal oxide semiconductor (CMOS)-compatible TiN electrode engineering. Strained TiN top-layer electrodes with different nitrogen (N) concentrations are deposited by adjusting the sputtering process conditions. The TiN electrode with 18% N exhibits a compressive characteristic, which induces tensile stress in a 5 nm HZO film. A device with 18% N in TiN shows a higher remanent polarization (2Pr) and larger capacitance value than the compared sample, indicating that the strained TiN is promising for enhancing the ferroelectricity of sub-5 nm HZO devices.",

keywords = "Compressive, Ferroelectric, HfZrO2, Strained TiN, Sub-5 nm",

author = "Wu, {Cheng Hung} and Wang, {Kuan Chi} and Wang, {Yu Yun} and Chenming Hu and Chun-Jung Su and Tian-Li Wu",

note = "Publisher Copyright: {\textcopyright} 2022 by the authors. Licensee MDPI, Basel, Switzerland.",

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doi = "10.3390/nano12030468",

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T1 - Enhancement of Ferroelectricity in 5 nm Metal-Ferroelectric-Insulator Technologies by Using a Strained TiN Electrode

AU - Wu, Cheng Hung

AU - Wang, Kuan Chi

AU - Wang, Yu Yun

AU - Hu, Chenming

AU - Su, Chun-Jung

AU - Wu, Tian-Li

PY - 2022/2/1

Y1 - 2022/2/1

N2 - In this work, the ferroelectric characteristic of a 5 nm Hf0.5Zr0.5O2 (HZO) metal-ferroelectric-insulator-semiconductor (MFIS) device is enhanced through strained complementary metal oxide semiconductor (CMOS)-compatible TiN electrode engineering. Strained TiN top-layer electrodes with different nitrogen (N) concentrations are deposited by adjusting the sputtering process conditions. The TiN electrode with 18% N exhibits a compressive characteristic, which induces tensile stress in a 5 nm HZO film. A device with 18% N in TiN shows a higher remanent polarization (2Pr) and larger capacitance value than the compared sample, indicating that the strained TiN is promising for enhancing the ferroelectricity of sub-5 nm HZO devices.

AB - In this work, the ferroelectric characteristic of a 5 nm Hf0.5Zr0.5O2 (HZO) metal-ferroelectric-insulator-semiconductor (MFIS) device is enhanced through strained complementary metal oxide semiconductor (CMOS)-compatible TiN electrode engineering. Strained TiN top-layer electrodes with different nitrogen (N) concentrations are deposited by adjusting the sputtering process conditions. The TiN electrode with 18% N exhibits a compressive characteristic, which induces tensile stress in a 5 nm HZO film. A device with 18% N in TiN shows a higher remanent polarization (2Pr) and larger capacitance value than the compared sample, indicating that the strained TiN is promising for enhancing the ferroelectricity of sub-5 nm HZO devices.

KW - Compressive

KW - Ferroelectric

KW - HfZrO2

KW - Strained TiN

KW - Sub-5 nm

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JF - Nanomaterials

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Enhancement of Ferroelectricity in 5 nm Metal-Ferroelectric-Insulator Technologies by Using a Strained TiN Electrode

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Keywords

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