Emerging Plasma Nanotechnology Atomic Layer Technologies for Nano Materials and Devices

Research output: Contribution to journalArticlepeer-review

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Abstract

Developments in plasma process technology have led to innovative advances in the miniaturization and integration of semiconductor devices. However, when semiconductor devices are utilized in the nanoscale domain, defects or damage related to charged particles and ultraviolet (UV) rays emitted from the plasma can emerge, resulting in degraded characteristics for nanodevices. It is thus imperative to come up with a method that suppresses or controls the charge accumulation and ultraviolet (UV) damage in plasma processing. This paper reviews our work on a neutral beam process that suppresses the formation of defects at the atomic layer level on the processed surface, which makes it possible for ideal surface chemical reactions to occur at room temperature. This is vital for the creation of innovative nano-devices in the future.

Original languageEnglish
Pages (from-to)1-15
Number of pages15
JournalIEEE Open Journal of Nanotechnology
DOIs
StateAccepted/In press - 2022

Keywords

  • 3D Fin FET
  • Atomic layer defect-free deposition
  • Atomic layer defect-free etching
  • Etching
  • Ions
  • MRAM
  • Particle beams
  • Photonics
  • Plasmas
  • Quantum dot devices
  • Radiation effects
  • Silicon
  • Super low-k film

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