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Elimination of dielectric degradation for chemical-mechanical planarization of low-k hydrogen silisesquioxane
Ting Chang Chang*, Po-Tsun Liu, Tsung Ming Tsai, Fon Shan Yeh, Tseung-Yuen Tseng, Ming Shih Tsai, Ben Chang Chen, Ya Liang Yang, Simon M. Sze
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
8
Scopus
citations