Eliminating dielectric degradation of low-k organosilicate glass by trimethylchlorosilane treatment

T. C. Chang*, Po-Tsun Liu, Y. S. Mor, T. M. Tsai, C. W. Chen, Y. J. Mei, Fu-Ming Pan, W. F. Wu, S. M. Sze

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

40 Scopus citations

Fingerprint

Dive into the research topics of 'Eliminating dielectric degradation of low-k organosilicate glass by trimethylchlorosilane treatment'. Together they form a unique fingerprint.

Engineering & Materials Science

Physics & Astronomy