Effects of Process and Gate Doping Species on Negative-Bias-Temperature Instability of p-Channel MOSFETs

Da Yuan Lee*, Tiao Yuan Huang, Horng-Chih Lin, Wan Ju Chiang, Guo Wei Huang, Ta-Hui Wang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

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Material Science

Engineering

Earth and Planetary Sciences