Fingerprint
Dive into the research topics of 'Effects of low tempersture NH3 treatment on HfO2/SiO2 stack gate dielectrics fabricated by MOCVD system'. Together they form a unique fingerprint.- Sort by
- Weight
- Alphabetically
Effects of low tempersture NH3 treatment on HfO2/SiO2 stack gate dielectrics fabricated by MOCVD system
Wen Tai Lu*, Chao-Hsin Chien, Ying Chang Lin, Ming Jui Yang, Tiao Yuan Huang
*Corresponding author for this work
Research output: Contribution to conference › Paper › peer-review