Effects of H2 and Ar flow rates on the deposition of hydrogenated silicon thin films by an inductive coupled plasma-chemical vapor deposition system

Chuan Li*, J. H. Hsieh, K. L. Huang, Yu Ting Shao, Yi Wen Chen

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

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Engineering & Materials Science

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Chemical Compounds