Effects of channel width on electrical characteristics of polysilicon TFTs with multiple nanowire channels

Yung Chun Wu*, Ting Chang Chang, Po-Tsun Liu, Chi Shen Chen, Chun Hao Tu, Hsiao-Wen Zan, Ya-Hsiang Tai, Chun Yen Chang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

23 Scopus citations

Abstract

This brief studies the electrical characteristics of a series of polysilicon thin-film transistors (poly-Si TFTs) with different numbers of multiple channels of various widths, with lightly doped drain (LDD) structures. The nanoscale TFT with ten 67-nm-wide split channels (M10) has superior and more uniform electrical characteristics than other TFTs. Additionally, experimental results reveal that the electrical performance of proposed TFTs enhances with each channel width decreasing, yielding a profile from a single-gate to tri-gate structure.

Original languageEnglish
Pages (from-to)2343-2346
Number of pages4
JournalIEEE Transactions on Electron Devices
Volume52
Issue number10
DOIs
StatePublished - Oct 2005

Keywords

  • Lightly doped drain (LDD)
  • Nanowire
  • Polysilicon
  • Thin-film transistor (TFT)

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