Effects of Ar/N2 flow ratio on sputtered-AlN film and its application to low-voltage organic thin-film transistors

Hsiao-Wen Zan*, Kuo Hsi Yen, Pu Kuan Liu, Kuo Hsin Ku, Chien Hsun Chen, Jennchang Hwang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

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Engineering & Materials Science

Physics & Astronomy