Effects of a dual spacer on electrical characteristics and random telegraph noise of gate-all-around silicon nanowire p-type metal-oxide-semiconductor field-effect transistors

Sekhar Reddy Kola, Yi-Ming Li*, Narasimhulu Thoti

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

14 Scopus citations

Fingerprint

Dive into the research topics of 'Effects of a dual spacer on electrical characteristics and random telegraph noise of gate-all-around silicon nanowire p-type metal-oxide-semiconductor field-effect transistors'. Together they form a unique fingerprint.

Keyphrases

Material Science

Engineering