Effectiveness of Si thin buffer layer for selective SiGe epitaxial growth in recessed source and drain for pMOS
- P. L. Cheng*
- , C. I. Liao
- , C. C. Chien
- , C. L. Yang
- , S. F. Ting
- , L. S. Jeng
- , C. T. Huang
- , Osbert Cheng
- , S. F. Tzou
- , Wen-Syang Hsu
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
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