Effective surface treatments for selective epitaxial SiGe growth in locally strained pMOSFETs

P. L. Cheng*, C. I. Liao, H. R. Wu, Y. C. Chen, C. C. Chien, C. L. Yang, S. F. Tzou, J. Tang, R. Kodali, L. Washington, Y. Cho, V. C. Chang, T. Fu, Wen-Syang Hsu

*Corresponding author for this work

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Engineering

Material Science