Effective improvement of high-k Hf-silicate/silicon interface with thermal nitridation

C. W. Yang*, Y. K. Fang, S. F. Chen, C. Y. Lin, M. F. Wang, Y. M. Lin, Tuo-Hung Hou, L. G. Yao, S. C. Chen, M. S. Liang

*Corresponding author for this work

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Material Science