Effect of surface passivation removal on planarization efficiency in Cu abrasive-free polishing

J. Y. Fang*, M. S. Tsai, B. T. Dai, Yew-Chuhg Wu, M. S. Feng

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

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Engineering & Materials Science

Chemical Compounds