Effect of carrier gas on the structure and electrical properties of low dielectric constant SiCOH film using trimethylsilane prepared by plasma enhanced chemical vapor deposition
- Y. L. Cheng*
- , Y. L. Wang
- , J. K. Lan
- , H. C. Chen
- , J. H. Lin
- , Y. L. Wu
- , Po-Tsun Liu
- , Yew-Chuhg Wu
- , M. S. Feng
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
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