Dual metal gates with band-edge work functions on novel HfLaO high-k gate dielectric

X. P. Wang, C. Shen, Ming Fu Li, H. Y. Yu, Yiyang Sun, Y. P. Feng, Andy Lim, Hwang Wan Sik, Albert Chin, Y. C. Yeo, Patrick Lo, D. L. Kwong

Research output: Chapter in Book/Report/Conference proceedingChapterpeer-review

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Engineering & Materials Science