Abstract
Conventional diagnoses of genetic mutation and disease depend on the analysis of DNA sequences. However, mismatches in the DNA sequences are difficult to detect using tradi- tional sequencing. Doping metal ions, such as nickel, into the short DNA (28 mer ~ 30 mer), markedly reduces its electrical resistance, which is measured by electrical impedance analysis. The change in resistance that is caused by a mismatched base-pair in short DNA can also be monitored by this approach. In this study, the resistance increased exponentially with the number of mismatched base-pairs. Accordingly, an intuitive and direct method for evaluating the number of DNA mismatches can possibly be developed.
| Original language | English |
|---|---|
| Pages (from-to) | 740-747 |
| Number of pages | 8 |
| Journal | Chinese Journal of Physics |
| Volume | 47 |
| Issue number | 5 |
| State | Published - Oct 2009 |