Keyphrases
Large Grain
100%
Hot Filament Chemical Vapor Deposition (HFCVD)
100%
Seed Layer
100%
Direct Growth
100%
Polycrystalline Silicon Film
100%
Aluminum-induced Crystallization
100%
Polysilicon
33%
Annealing Parameter
22%
Growth Quality
11%
Field Emission Scanning Electron Microscopy (FE-SEM)
11%
Crystallinity
11%
Crystal Quality
11%
Glass Substrate
11%
Electrical Properties
11%
Structural Properties
11%
Cm(III)
11%
Annealing Temperature
11%
Grain Size
11%
Si Photovoltaics
11%
Crystallization Process
11%
Hole Concentration
11%
Photovoltaic Applications
11%
Hall Measurement
11%
High Growth Rate
11%
Hall Mobility
11%
Raman Scattering Spectroscopy
11%
Annealing Duration
11%
Crystallization Annealing
11%
Thin-film Si
11%
Engineering
Chemical Vapor Deposition
100%
Vapor Deposition
100%
Seed Layer
100%
Polysilicon
100%
Thin Films
11%
Crystallinity
11%
Photovoltaics
11%
Crystalline Quality
11%
Promising Candidate
11%
Hole Concentration
11%
Field-Emission Scanning Electron Microscopy
11%
High Growth Rate
11%
Glass Substrate
11%
Raman Spectra
11%
Material Science
Film
100%
Chemical Vapor Deposition
100%
Silicon
100%
Aluminum
100%
Thin Films
12%
Annealing
12%
Photovoltaics
12%
Grain Size
12%
Crystallization
12%
Field Emission Scanning Electron Microscopy
12%
Hole Concentration
12%
Hall Mobility
12%