Dielectric and Barrier Properties of Spin-On Organic Aromatic Low Dielectric Constant Polymers FLARE and SiLK

Zhen Cheng Wu*, Zhi Wen Shiung, Ren Guay Wu, Yu Lin Liu, Wei Hao Wu, Bing-Yue Tsui, Mao Chieh Chen, Weng Chang, Pei Fen Chou, Syun Ming Jang, Chen Hua Yu, Mong Song Liang

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    12 Scopus citations

    Abstract

    This work investigates the dielectric and barrier properties of two species of organic aromatic low dielectric constant (low-k) polymers, namely, FLARE and SiLK. Experimental results indicate that both of the low-k polymers exhibit acceptable thermal stability with respect to a thermal annealing at 400°C for 8 h in an N2 ambient. Moreover, they show a good dielectric barrier property against Cu penetration under bias-temperature stressing (BTS) at 150°C with an applied effective field of 0.8 MV/cm. Nevertheless, an anomalous instability of the capacitance-voltage curve was observed for the first time under BTS. This finding is explained by the proposed model of stress induced dielectric polarization charges within these organic aromatic polymers. The polarization instability may seriously degrade the long term reliability of circuit operations.

    Original languageEnglish
    JournalJournal of the Electrochemical Society
    Volume148
    Issue number6
    DOIs
    StatePublished - 1 Jun 2001

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