Device performance of graphene nanoribbon field effect transistors with edge roughness effects: A computational study

Zuan Yi Leong*, Kai Tak Lam, Gengchiau Liang

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

5 Scopus citations

Abstract

The device performance of armchair edge graphene nanoribbon Schottky barrier field effect transistors (A-GNR SBFETs) over different edge roughness and widths are investigated over a wide range of devices in terms of I ON/I OFF. Generally, wider GNRs outperform narrower GNRs in the presence of edge roughness effects with average leakage current reduced up to ∼400% less. . The average leakage current for 2.2nm width GNR SBFETs increased 2.7 times when edge roughness increased from 5% to 10%, while the same for 1.4nm widths increased 11.2 times In addition, a small amount of ER of 5% is well tolerated by all GNR SBFETs, with the average I ON/I OFF lowered from 4012 to 3075 for 1.4nm widths. However, a further increase in ER to 20% degrades performance greatly, dropping I ON/I OFF to 273. The generally reliable performance of GNR SBFETs at small edge irregularities over channel widths is reported and a detailed statistical investigation provided.

Original languageEnglish
Title of host publicationProceedings - 2009 13th International Workshop on Computational Electronics, IWCE 2009
DOIs
StatePublished - 2009
Event2009 13th International Workshop on Computational Electronics, IWCE 2009 - Beijing, China
Duration: 27 May 200929 May 2009

Publication series

NameProceedings - 2009 13th International Workshop on Computational Electronics, IWCE 2009

Conference

Conference2009 13th International Workshop on Computational Electronics, IWCE 2009
Country/TerritoryChina
CityBeijing
Period27/05/0929/05/09

Keywords

  • Edge roughness
  • FET
  • Graphene
  • NEGF
  • Nanoribbon

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