Development of stable micro-crystalline silicon AMLCD

Chan Ching Chang; Chih Hsien Chen; Ya Hui Peng; Yeong Shyang Lee; Chih Yuan Hou; Kun Fu Huang; Houg Tao Shih; Fan Shin Tseng; Ming Ta Hsieh; Jenn-Fang Chen

Development of stable micro-crystalline silicon AMLCD

Chan Ching Chang^*, Chih Hsien Chen, Ya Hui Peng, Yeong Shyang Lee, Chih Yuan Hou, Kun Fu Huang, Houg Tao Shih, Fan Shin Tseng, Ming Ta Hsieh, Jenn-Fang Chen

^*Corresponding author for this work

Department of Electrophysics

Research output: Contribution to conference › Paper › peer-review

Abstract

Bottom-gate microcrystalline silicon thin film transistors (μc-Si TFTs) have been produced by the radio frequency glow discharge technique using three different plasma treatment on the interface between microcrystalline and SiN layers. Our first microcrystalline silicon TFTs have better stability at high temperature stress.

Original language	English
Pages	1921-1923
Number of pages	3
State	Published - Dec 2007
Event	14th International Display Workshops, IDW '07 - Sapporo, Japan Duration: 5 Dec 2007 → 5 Dec 2007

Conference

Conference	14th International Display Workshops, IDW '07
Country/Territory	Japan
City	Sapporo
Period	5/12/07 → 5/12/07

Keywords

Amorphous silicon and defect
High mobility
Micro-crystalline
TFTLCD

Cite this

@conference{27cd7276fc35485aae6ba955f2001ec4,

title = "Development of stable micro-crystalline silicon AMLCD",

abstract = "Bottom-gate microcrystalline silicon thin film transistors (μc-Si TFTs) have been produced by the radio frequency glow discharge technique using three different plasma treatment on the interface between microcrystalline and SiN layers. Our first microcrystalline silicon TFTs have better stability at high temperature stress.",

keywords = "Amorphous silicon and defect, High mobility, Micro-crystalline, TFTLCD",

author = "Chang, {Chan Ching} and Chen, {Chih Hsien} and Peng, {Ya Hui} and Lee, {Yeong Shyang} and Hou, {Chih Yuan} and Huang, {Kun Fu} and Shih, {Houg Tao} and Tseng, {Fan Shin} and Hsieh, {Ming Ta} and Jenn-Fang Chen",

year = "2007",

month = dec,

language = "English",

pages = "1921--1923",

note = "14th International Display Workshops, IDW '07 ; Conference date: 05-12-2007 Through 05-12-2007",

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TY - CONF

T1 - Development of stable micro-crystalline silicon AMLCD

AU - Chang, Chan Ching

AU - Chen, Chih Hsien

AU - Peng, Ya Hui

AU - Lee, Yeong Shyang

AU - Hou, Chih Yuan

AU - Huang, Kun Fu

AU - Shih, Houg Tao

AU - Tseng, Fan Shin

AU - Hsieh, Ming Ta

AU - Chen, Jenn-Fang

PY - 2007/12

Y1 - 2007/12

N2 - Bottom-gate microcrystalline silicon thin film transistors (μc-Si TFTs) have been produced by the radio frequency glow discharge technique using three different plasma treatment on the interface between microcrystalline and SiN layers. Our first microcrystalline silicon TFTs have better stability at high temperature stress.

AB - Bottom-gate microcrystalline silicon thin film transistors (μc-Si TFTs) have been produced by the radio frequency glow discharge technique using three different plasma treatment on the interface between microcrystalline and SiN layers. Our first microcrystalline silicon TFTs have better stability at high temperature stress.

KW - Amorphous silicon and defect

KW - High mobility

KW - Micro-crystalline

KW - TFTLCD

UR - http://www.scopus.com/inward/record.url?scp=43349084687&partnerID=8YFLogxK

M3 - Paper

AN - SCOPUS:43349084687

SP - 1921

EP - 1923

T2 - 14th International Display Workshops, IDW '07

Y2 - 5 December 2007 through 5 December 2007

ER -

Development of stable micro-crystalline silicon AMLCD

Abstract

Conference

Keywords

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