Development of a confined pulse-jet particle cleaning technology for semiconductor wafers

H. Chein; T. Y. Huang; Chuen-Tinn Tsai

doi:10.1016/S0021-8502(98)90612-7

Development of a confined pulse-jet particle cleaning technology for semiconductor wafers

H. Chein^*, T. Y. Huang, Chuen-Tinn Tsai

^*Corresponding author for this work

Institute of Environmental Engineering

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	S859-S860
Journal	Journal of Aerosol Science
Volume	29
Issue number	SUPPL.2
DOIs	https://doi.org/10.1016/S0021-8502(98)90612-7
State	Published - 1998

Keywords

Particle Cleaning
Pulse-Jet
Semiconductor Wafers

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10.1016/S0021-8502(98)90612-7

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title = "Development of a confined pulse-jet particle cleaning technology for semiconductor wafers",

keywords = "Particle Cleaning, Pulse-Jet, Semiconductor Wafers",

author = "H. Chein and Huang, {T. Y.} and Chuen-Tinn Tsai",

year = "1998",

doi = "10.1016/S0021-8502(98)90612-7",

language = "English",

volume = "29",

pages = "S859--S860",

journal = "Journal of Aerosol Science",

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TY - JOUR

T1 - Development of a confined pulse-jet particle cleaning technology for semiconductor wafers

AU - Chein, H.

AU - Huang, T. Y.

AU - Tsai, Chuen-Tinn

PY - 1998

Y1 - 1998

KW - Particle Cleaning

KW - Pulse-Jet

KW - Semiconductor Wafers

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U2 - 10.1016/S0021-8502(98)90612-7

DO - 10.1016/S0021-8502(98)90612-7

M3 - Article

AN - SCOPUS:11544362764

SN - 0021-8502

VL - 29

SP - S859-S860

JO - Journal of Aerosol Science

JF - Journal of Aerosol Science

IS - SUPPL.2

ER -

Development of a confined pulse-jet particle cleaning technology for semiconductor wafers

Keywords

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