Design on latchup-free power-rail ESD clamp circuit in high-voltage CMOS ICs

Kun Hsien Lin*, Ming-Dou Ker

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    13 Scopus citations

    Abstract

    The holding voltage of the high-voltage ESD protection devices in snapback breakdown condition has been found to be much smaller than the power supply voltage. Such characteristics will cause the high-voltage CMOS ICs susceptible to the latchup-like danger in the real system applications, especially while these devices are used in the power-rail ESD clamp circuit. A new latchup-free design on the power-rail ESD clamp circuit with stacked-field-oxide structure is proposed and successfully verified in a 0.25-μm 40-V CMOS process to achieve the desired ESD level. The total holding voltage of the stacked-field-oxide structure in snapback breakdown condition can be larger than the power supply voltage. Therefore, latchup or latchup-like issues can be avoided by stacked-field-oxide structures for the IC applications with VDD of 40V.

    Original languageEnglish
    Title of host publication2004 Electrical Overstress/Electrostatic Discharge Symposium, EOS/ESD '04
    DOIs
    StatePublished - 1 Dec 2004
    Event2004 Electrical Overstress/Electrostatic Discharge Symposium, EOS/ESD '04 - Grapevine, TX, United States
    Duration: 19 Sep 200423 Sep 2004

    Publication series

    NameElectrical Overstress/Electrostatic Discharge Symposium Proceedings
    ISSN (Print)0739-5159

    Conference

    Conference2004 Electrical Overstress/Electrostatic Discharge Symposium, EOS/ESD '04
    Country/TerritoryUnited States
    CityGrapevine, TX
    Period19/09/0423/09/04

    Fingerprint

    Dive into the research topics of 'Design on latchup-free power-rail ESD clamp circuit in high-voltage CMOS ICs'. Together they form a unique fingerprint.

    Cite this