Design of negative charge pump circuit with polysilicon diodes in a 0.25 μm CMOS process

Ming-Dou Ker, Chyh Yih Chang, Hsin Chin Jiang

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    16 Scopus citations

    Abstract

    A charge pump circuit realized with the substrate-isolated polysilicon diode in the 0.25 μm CMOS process is proposed. With the polysilicon diode, the stable negative voltage generation can be realized in general sub-quarter-micron CMOS process without extra process modification or additional mask layer. The device characteristic of polysilicon diode and the voltage waveforms of the negative charge pump circuit have been successfully verified in a 0.25 μm CMOS process with grounded p-type substrate.

    Original languageEnglish
    Title of host publication2002 IEEE Asia-Pacific Conference on ASIC, AP-ASIC 2002 - Proceedings
    PublisherInstitute of Electrical and Electronics Engineers Inc.
    Pages145-148
    Number of pages4
    ISBN (Electronic)0780373634, 9780780373631
    DOIs
    StatePublished - 2002
    Event3rd IEEE Asia-Pacific Conference on ASIC, AP-ASIC 2002 - Taipei, Taiwan
    Duration: 6 Aug 20028 Aug 2002

    Publication series

    Name2002 IEEE Asia-Pacific Conference on ASIC, AP-ASIC 2002 - Proceedings

    Conference

    Conference3rd IEEE Asia-Pacific Conference on ASIC, AP-ASIC 2002
    Country/TerritoryTaiwan
    CityTaipei
    Period6/08/028/08/02

    Keywords

    • Polysilicon diode
    • charge pump circuit

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