Abstract
An nMOS-blocking technique for mixed-voltage I/O buffer realized with only 1 × V DD devices can receive 2 ×V DD, 3 × V DD, and even 4 × V DD input signal without the gate-oxide reliability issue is proposed. In this paper, the 2 × V DD input tolerant mixed-voltage I/O buffer by using the nMOS-blocking technique has been verified in a 0.25-μm 2.5-V CMOS process to serve 2.5/5-V mixed-voltage interface. The 3 × V DD input tolerant mixed-voltage I/O buffer by using the nMOS-blocking technique has been verified in a 0.13-μm 1-V CMOS process to serve 1/3-V mixed-voltage interface. The proposed nMOS-blocking technique can be extended to design the 4 × V DD, 5 × V DD, and even 6 × V DD input tolerant mixed-voltage I/O buffers. The limitation of the nMOS-blocking technique is the breakdown voltage of the pn-junction in the given CMOS process.
Original language | English |
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Article number | 1703687 |
Pages (from-to) | 2324-2333 |
Number of pages | 10 |
Journal | IEEE Journal of Solid-State Circuits |
Volume | 41 |
Issue number | 10 |
DOIs | |
State | Published - 1 Oct 2006 |
Keywords
- Gate-oxide reliability
- Hot-carrier degradation
- Interface
- Junction breakdown
- Mixed-voltage I/O buffer