Abstract
A new structure of bond pad is proposed to reduce its parasitic capacitance in a baseline CMOS process without any process modification. The proposed bond pad has a capacitance less than 50% of that in the traditional bond pad. In addition, this new bond pad also provides better bonding adhesion of 10% improvement than the traditional one. It is greatly useful for high-frequency IC's, which need a very low input capacitance.
Original language | English |
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Article number | 880752 |
Pages (from-to) | 293-296 |
Number of pages | 4 |
Journal | Proceedings of the Annual IEEE International ASIC Conference and Exhibit |
DOIs | |
State | Published - 13 Sep 2000 |
Event | Proceedings of the 13th Annual IEEE International ASIC/SOC Conference - Arlington, VA, USA Duration: 13 Sep 2000 → 16 Sep 2000 |