Abstract
Four new device structures for power-rail ESD clamp circuits by using the substrate-triggering technique are investigated in submicron CMOS technology to improve ESD level of the protection device within a smaller silicon area. Experimental results in a 0.6-μm CMOS process have verified that the ESD clamp circuit with the double-BJT structure can provide 200% higher ESD robustness in per unit layout area as comparing to the previous design with the NMOS device.
Original language | English |
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Pages (from-to) | 287-290 |
Number of pages | 4 |
Journal | Proceedings of the Annual IEEE International ASIC Conference and Exhibit |
DOIs | |
State | Published - 1 Jan 1997 |
Event | Proceedings of the 1997 10th Annual IEEE International ASIC Conference and Exhibit - Portland, OR, USA Duration: 7 Sep 1997 → 10 Sep 1997 |